Synthesis and characterization of copper(I) amidinates as precursors for atomic layer deposition (ALD) of copper metal.
نویسندگان
چکیده
A series of copper(I) amidinates of the general type [(R'NC(R)NR'')Cu](2) (R' and R'' = n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl; R = methyl, n-butyl) have been synthesized and characterized. These compounds are planar dimers, bridged by nearly linear N-Cu-N bonds. Their properties (volatility, low melting point, high thermal stability, and self-limited surface reactivity) are well-suited for atomic layer deposition (ALD) of copper metal films that are pure, highly conductive, conformal, and strongly adherent to substrates.
منابع مشابه
Surface Chemistry of Copper(I) Acetamidinates in Connection with Atomic Layer Deposition (ALD) Processes
Given the high stability of amidines, they have long been considered good choices as bidentate ligands in organometallic compounds. Early uses of metal amidinates have been reported in catalysis to promote polymerizations and other related reactions. 3 More recently, metal amidinates have been developed as promising precursors for the deposition of solid thin films. 8 They have proven particula...
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عنوان ژورنال:
- Inorganic chemistry
دوره 44 6 شماره
صفحات -
تاریخ انتشار 2005